DOI: 10.1007/bf00331780. Interfacial reaction barriers during thin-film solid-state reactions: The crystallographic origin of kinetic barriers at the NiS2/Si(111) interface

Interfacial reaction barriers during thin-film solid-state reactions: The crystallographic origin of kinetic barriers at the NiS2/Si(111) interface

10.1007/bf00331780

Crossref journal-article

Springer Science and Business Media LLC

Applied Physics A Solids and Surfaces (297)

Bibliography

Hesse, D., Werner, P., Mattheis, R., & Heydenreich, J. (1993). Interfacial reaction barriers during thin-film solid-state reactions: The crystallographic origin of kinetic barriers at the NiS2/Si(111) interface. Applied Physics A Solids and Surfaces, 57(5), 415â425.

Authors 4

D. Hesse (first)
P. Werner (additional)
R. Mattheis (additional)
J. Heydenreich (additional)

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Dates

Type	When
Created	20 years, 10 months ago (Oct. 24, 2004, 1:19 a.m.)
Deposited	6 years, 4 months ago (April 8, 2019, 7:23 p.m.)
Indexed	1 year, 6 months ago (Feb. 10, 2024, 7:39 p.m.)
Issued	31 years, 10 months ago (Nov. 1, 1993)
Published	31 years, 10 months ago (Nov. 1, 1993)
Published Print	31 years, 10 months ago (Nov. 1, 1993)

Funders 0

None

BibTeX

@article{Hesse_1993, title={Interfacial reaction barriers during thin-film solid-state reactions: The crystallographic origin of kinetic barriers at the NiS2/Si(111) interface}, volume={57}, ISSN={1432-0630}, url={http://dx.doi.org/10.1007/bf00331780}, DOI={10.1007/bf00331780}, number={5}, journal={Applied Physics A Solids and Surfaces}, publisher={Springer Science and Business Media LLC}, author={Hesse, D. and Werner, P. and Mattheis, R. and Heydenreich, J.}, year={1993}, month=nov, pages={415–425} }

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