DOI: 10.1007/978-1-4899-1588-7_20. Understanding the Surface Chemical and Structural Implications of HF Solution Cleaning of Silicon

Understanding the Surface Chemical and Structural Implications of HF Solution Cleaning of Silicon

10.1007/978-1-4899-1588-7_20

Crossref book-chapter

Springer US

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 (297)

Bibliography

Higashi, G. S. (1993). Understanding the Surface Chemical and Structural Implications of HF Solution Cleaning of Silicon. The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2, 187â197.

Authors 1

G. S. Higashi (first)

References 23 Referenced 1

W. Kern: J. Electrochem. Soc. 137 (1990) 1887. (10.1149/1.2086825) / J. Electrochem. Soc. by W Kern (1990)
W. Kern and D. Puotinen: RCA Rev. 31 (1970) 187. / RCA Rev. by W Kern (1970)
M. Grundner and H. Jacob: Appl. Phys. A 39 (1986) 73. (10.1007/BF00616822) / Appl. Phys. A by M Grundner (1986)
P. J. Grunthaner, F. J. Grunthaner, R. W. Fathauer, T. L. Lin, M. H. Hecht, L. D. Bell, W. J. Kaiser, F. D. Schowengerdt, and J. H. Mazur: Thin Solid Films 183 (1989) 197. (10.1016/0040-6090(89)90445-8) / Thin Solid Films by PJ Grunthaner (1989)
D. B. Fenner, D. K. Biegelsen, and R. D. Bringans: J. Appl. Phys. 66 (1989) 419. (10.1063/1.343839) / J. Appl. Phys. by DB Fenner (1989)
T. Takahagi, I. Nagai, A. Ishitani, H. Kuroda, and Y. Nagasawa: J. Appl. Phys. 64 (1988) 3516. (10.1063/1.341489) / J. Appl. Phys. by T Takahagi (1988)
E. Yablonovitch, D. L. Allara, C. C. Chang, T. Gmitter, and T. B. Bright: Phys. Rev. Lett. 57 (1986) 249. (10.1103/PhysRevLett.57.249) / Phys. Rev. Lett. by E Yablonovitch (1986)
V. A. Burrows, Y. J. Chabal, G. S. Higashi, K. Raghavachari, and S. B. Christman: Appl. Phys. Lett. 53 (1988) 998. (10.1063/1.100053) / Appl. Phys. Lett. by VA Burrows (1988)
H. Ubara, T. Imura, and A. Hiraki: Solid State Comm. 50 (1984) 673. (10.1016/0038-1098(84)90156-X) / Solid State Comm. by H Ubara (1984)
G. W. Trucks, K. Raghavachari, G. S. Higashi, and Y. J. Chabal: 65 (1990) 504.
Y. J. Chabal, G. S. Higashi, K. Raghavachari, and V. A. Burrows: J. Vac. Sci. Technol. A 7 (1989) 2104. (10.1116/1.575980) / J. Vac. Sci. Technol. A by YJ Chabal (1989)
S. M. Hu and D. R. Kerr: J. Electrochem. Soc. 114 (1967) 414. (10.1149/1.2426612) / J. Electrochem. Soc. by SM Hu (1967)
W. Hoffmeister: Int. J. Appl. Radiat. Isot. 2 (1969) 139. (10.1016/0020-708X(69)90156-2) / Int. J. Appl. Radiat. Isot. by W Hoffmeister (1969)
G. S. Higashi, Y. J. Chabal, G. W. Trucks, and K. Raghavachari: Appl. Phys. Lett. 56 (1990) 656. (10.1063/1.102728) / Appl. Phys. Lett. by GS Higashi (1990)
P. Dumas, Y. J. Chabal, and G. S. Higashi: Phys. Rev. Lett. 65 (1990) 1124. (10.1103/PhysRevLett.65.1124) / Phys. Rev. Lett. by P Dumas (1990)
G. S. Higashi, R. S. Becker, Y. J. Chabal, and A. J. Becker: Appl. Phys. Lett. 58 (1991) 1656. (10.1063/1.105155) / Appl. Phys. Lett. by GS Higashi (1991)
P. Jakob, Y. J. Chabal, K. Raghavachari, P. Dumas: submitted to Appl. Phys. Lett.
P. Jakob and Y. J. Chabal: J. Chem. Phys. 95, 2897 (1991). (10.1063/1.460892) / J. Chem. Phys. by P Jakob (1991)
R. S. Becker, G. S. Higashi, Y. J. Chabal, and A. J. Becker: Phys. Rev. Lett. 65 (1990) 1917. (10.1103/PhysRevLett.65.1917) / Phys. Rev. Lett. by RS Becker (1990)
R. B. Doak, Y. J. Chabal, G. S. Higashi, and P. Dumas: J. Electron Spectroscopy and Related Phenomena 54/55 (1990) 291. (10.1016/0368-2048(90)80221-U) / J. Electron Spectroscopy and Related Phenomena by RB Doak (1990)
P. Dumas and Y. J. Chabal: Chem. Phys. Lett. 181 (1991) 537. (10.1016/0009-2614(91)80309-L) / Chem. Phys. Lett. by P Dumas (1991)
J.S. Judge, J. Electrochem. Soc. 118, 1772 (1971). (10.1149/1.2407835) / J. Electrochem. Soc. by JS Judge (1971)
S. Watanabe, N. Nakayama and T. Ito, Appl. Phys. Lett. 59, 1458 (1991). (10.1063/1.105287) / Appl. Phys. Lett. by S Watanabe (1991)

Dates

Type	When
Created	11 years, 9 months ago (Nov. 5, 2013, 11:45 p.m.)
Deposited	6 years, 2 months ago (May 23, 2019, 10:48 p.m.)
Indexed	11 months, 1 week ago (Sept. 7, 2024, 8:30 p.m.)
Issued	32 years, 7 months ago (Jan. 1, 1993)
Published	32 years, 7 months ago (Jan. 1, 1993)
Published Print	32 years, 7 months ago (Jan. 1, 1993)

Funders 0

None

BibTeX

@inbook{Higashi_1993, title={Understanding the Surface Chemical and Structural Implications of HF Solution Cleaning of Silicon}, ISBN={9781489915887}, url={http://dx.doi.org/10.1007/978-1-4899-1588-7_20}, DOI={10.1007/978-1-4899-1588-7_20}, booktitle={The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2}, publisher={Springer US}, author={Higashi, G. S.}, year={1993}, pages={187–197} }

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