DOI: 10.1007/0-387-23313-x_2. Ion

10.1007/0-387-23313-x_2

Crossref book-chapter

Springer US

Introduction to Focused Ion Beams (297)

Bibliography

Giannuzzi, L. A., Prenitzer, B. I., & Kempshall, B. W. (2005). Ion - Solid Interactions. Introduction to Focused Ion Beams, 13â52.

Authors 3

Lucille A. Giannuzzi (first)
Brenda I. Prenitzer (additional)
Brian W. Kempshall (additional)

References 35 Referenced 23

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Andersen HH and Bay HL, “Sputtering Yield Measurements,” in Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids, ed. R Behrisch, Springer Verlag, Berlin, 145–218 (1981). (10.1007/3540105212_9) / Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids by H.H. Andersen (1981)
ANSI N1.1-1976, American National Standards Glossary of Terms in Nuclear Science and Technology, American National Standards Institute New York, NY (1976)
Averbeck RS, Ghaly M, “A Model for Surface Damage in Ion-Irradiated Solids,” Journal of Applied Physics, 76,6, 3908 (1994). (10.1063/1.357398) / Journal of Applied Physics by R.S. Averbeck (1994)
Barna A, Barna, PB, Zalar A, “Ion Beam induced roughness and its effect in AES depth profiling of multilayer Ni/Cr thin films,” Surface and Interface Analysis, 121–2, 144–150 (1988). (10.1002/sia.740120215) / Surface and Interface Analysis by A. Barna (1988)
Barna A and Barna PB, Zalar, A, “Analysis of the development of large area surface topography during ion etching,” Vacuum, 40,1–2, 115–120 (1990). (10.1016/0042-207X(90)90134-K) / Vacuum by A. Barna (1990)
Behrisch R, “Introduction and Overview,” in Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids, ed. R Behrisch, Springer Verlag, Berlin, 1–8. (1981). (10.1007/3540105212_6) / Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids by R. “. Behrisch (1981)
FEI Focused Ion Beam Application Note, “High Aspect Ratio Hole Drilling Using FIB Enhanced Etch Process,” FEI Company 7451 NE Evergreen Parkway; Hillsboro, OR 97124, (1993). / High Aspect Ratio Hole Drilling Using FIB Enhanced Etch Process by FEI Focused Ion Beam Application Note (1993)
Franklin RE, Kirk ECC, Cleaver JRA, and Ahmed H, Journal of Materials Science Letters 7, 39 (1988). (10.1007/BF01729909) / Journal of Materials Science Letters by R.E. Franklin (1988)
Gibbons JF, Johnson WS, Mylroie SW, Projected Range Statistics: Semiconductors and Related Materials, Dowden, Hutchinson, and Ross, Inc. Stroudsburg, PA, pp. 3–27. (1975). / Projected Range Statistics: Semiconductors and Related Materials by J.F. Gibbons (1975)
Hosler W and Palmer W, Surface and Interface Analysis, 20, 609 (1993). (10.1002/sia.740200802) / Surface and Interface Analysis by W. Hosler (1993)
ICRP 60-1990, “Recommendations of the International Commission on Radiological Protection,” in Annals of the ICRP Vol. 21/1–3 Edited by ICRP (1991) (10.1016/0146-6453(91)90067-Q)
Ishitani T, Tsuboi H, Yaguchi T, and Koike H, “Transmission Electron Microscope Sample Preparation Using a Focused Ion Beam,” J. Electron Microsc., Vol 43, pp. 322–26 (1994). / J. Electron Microsc. by T. Ishitani (1994)
Kempshall BW, Schwarz SM, Prenitzer BI, Giannuzzi LA, and Stevie FA, “Ion Channeling Effects on the FIB Milling of Copper,” Journal of Vacuum Science & Technology B, 19(3), 749–754 (May/Jun 2001). (10.1116/1.1368670) / Journal of Vacuum Science & Technology B by B.W. Kempshall (2001)
Kola RR, Celler GK, and Harriot LR, Materials Research Society Symposium Proceedings 279, 593 (1993). (10.1557/PROC-279-593) / Materials Research Society Symposium Proceedings by R.R. Kola (1993)
Liau, ZL and Mayer, JW, “Ion Bombardment Effects on Material Composition,” in Treatise on materials Science and Technology, ed. J K Hirvonen, Academic Press, New York, NY 17–50 (1980) / Treatise on materials Science and Technology by Z.L. Liau (1980)
Lindhard J, Scharff M, and Schiott HE, “Range Concepts on Heavy Ion Ranges” (Notes on Atomic Collisions 11), Mat. Fys. Medd. Dan. Vid. Selsk. 33, No. 14, p15. (1963). / Mat. Fys. Medd. Dan. Vid. Selsk. by J. Lindhard (1963)
Lindhard J, Physics Letters 12, 126 (1964). (10.1016/0031-9163(64)91133-3) / Physics Letters by J. Lindhard (1964)
Matteson TL, Kempshall BW, Schwarz SW, Houge EC, and Giannuzzi LA, “EBSP Investigation of Focused Ion Beam Surfaces,” Journal of Electronic Materials, 31(1), 33–39 (2002). (10.1007/s11664-002-0169-5) / Journal of Electronic Materials by T.L. Matteson (2002)
Nastasi M, Mayer JW and Hirvonen JK, Ion-Solid Interactions: Fundamentals and Applications, Cambridge University Press, Great Britain, (1996). (10.1017/CBO9780511565007) / Ion-Solid Interactions: Fundamentals and Applications by M. Nastasi (1996)
Onderdelinden D, Applied Physics Letters 8, 189 (1966). (10.1063/1.1754548) / Applied Physics Letters by D. Onderdelinden (1966)
Orloff J, Utlaut M, and Swanson L, High Resolution Focused Ion Beams: FIB and its Applications, Kluwer Academic/Plenum Publishers, NY, (2003). (10.1007/978-1-4615-0765-9) / High Resolution Focused Ion Beams: FIB and its Applications by J. Orloff (2003)
Palmer W, Wangemann K, Kampermann S, and Hosler W, Nuclear Instruments and Methods in Physics Research B 51, 34 (1990). / Physics Research B by W. Palmer (1990)
Prenitzer BI, Giannuzzi LA, Newman K, Brown SR, Irwin RB, Shofner TL, and Stevie FA, “Transmission Electron Microscope Specimen Preparation of Zn Powders Using the Focused Ion Beam Lift-Out Technique,” Met. Trans. A, Vol. 29A, pp. 2399–2405. (1998). (10.1007/s11661-998-0116-z) / Met. Trans. A by B.I. Prenitzer (1998)
Prenitzer, BI, “Investigation of Variables Affecting Focused Ion Beam Milling as Applied to Specimen Preparation for Electron Microscopy: A Correlation Between Monte Carlo Based Simulation and Empirical Observation, Ph.D. Dissertation, University of Central Florida, (1999). / Investigation of Variables Affecting Focused Ion Beam Milling as Applied to Specimen Preparation for Electron Microscopy: A Correlation Between Monte Carlo Based Simulation and Empirical Observation by B. “. Prenitzer (1999)
Rajsiri S, Kempshall BW, Schwarz SM, and Giannuzzi LA, “FIB Damage in Silicon: Amorphization or Redeposition?,” Microsc. and Microanal. 8(Suppl. 2), Microscopy Society of America, 50–51 (2002). (10.1017/S1431927602101577) / Microsc. and Microanal. by S. Rajsiri (2002)
Sigmund, P., Sputtering by Ion Bombardment: Theoretical Concepts, in Sputtering by Particle Bombardment I: Physical Sputtering of Single Element-Solids, R. Behrisch, ed., Topics in Applied Physics vol. 47 (Springer-Verlag, Berlin), (1991). / Topics in Applied Physics by P. Sigmund (1991)
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Ziegler, J.F., SRIM 2003, www.srim.org

Dates

Type	When
Created	19 years, 3 months ago (May 17, 2006, 4:46 a.m.)
Deposited	5 years, 4 months ago (April 14, 2020, 2:23 p.m.)
Indexed	1 month ago (July 16, 2025, 8:33 a.m.)
Issued	20 years, 7 months ago (Jan. 1, 2005)
Published	20 years, 7 months ago (Jan. 1, 2005)
Published Print	20 years, 7 months ago (Jan. 1, 2005)

Funders 0

None

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