DOI: 10.1006/jcph.1995.1153. A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography I: Algorithms and Two-Dimensional Simulations

A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography I: Algorithms and Two-Dimensional Simulations

10.1006/jcph.1995.1153

Crossref journal-article

Elsevier BV

Journal of Computational Physics (78)

Bibliography

Adalsteinsson, D., & Sethian, J. A. (1995). A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography I: Algorithms and Two-Dimensional Simulations. Journal of Computational Physics, 120(1), 128â144.

Authors 2

D. Adalsteinsson (first)
J.A. Sethian (additional)

References 0 Referenced 109

None

Dates

Type	When
Created	22 years, 10 months ago (Oct. 7, 2002, 12:02 p.m.)
Deposited	6 years, 3 months ago (May 7, 2019, 12:50 p.m.)
Indexed	4 months, 4 weeks ago (April 1, 2025, 8:02 a.m.)
Issued	30 years ago (Aug. 1, 1995)
Published	30 years ago (Aug. 1, 1995)
Published Print	30 years ago (Aug. 1, 1995)

Funders 0

None

BibTeX

@article{Adalsteinsson_1995, title={A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography I: Algorithms and Two-Dimensional Simulations}, volume={120}, ISSN={0021-9991}, url={http://dx.doi.org/10.1006/jcph.1995.1153}, DOI={10.1006/jcph.1995.1153}, number={1}, journal={Journal of Computational Physics}, publisher={Elsevier BV}, author={Adalsteinsson, D. and Sethian, J.A.}, year={1995}, month=aug, pages={128–144} }

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