DOI: 10.1002/sia.740230204. Applications of focused ion beams in microelectronics production, design and development

Applications of focused ion beams in microelectronics production, design and development

10.1002/sia.740230204

Crossref journal-article

Wiley

Surface and Interface Analysis (311)

Abstract

AbstractFocused ion beam (FIB) systems using gallium liquid metal ion sources can remove material with a lateral resolution below 50 nm and can produce metal deposition at a similar resolution with ion beam‐enhanced chemical vapour deposition. These capabilities have resulted in many valuable applications for the microelectronics industry. Circuit modifications are possible because existing connections can be severed and reconnected to different locations. Testing of circuitry can be enhanced by isolation of specific circuits, removal of overlayers and by creation of probe pads where desired. Grain sizes can be determined from secondary electron images by the delineation of individual grains due to orientation‐dependent channeling of the ion beam. Secondary ion mass spectrometry analyses of small areas can provide ion images, elemental identification of small areas and endpoint detection with depth profiles. Scanning electron microscopy and transmission electron microscopy sections are prepared routinely using the FIB. These FIB‐prepared sections are notable because specific features, such as defects, can be exposed and a range of materials including silicon, indium phosphide, gallium arsenide and even metal layers can be cut without distortion. Transmission electron micrographs of superior quality have been obtained with a large area of very uniform thickness that permits identification of features such as areas under stress.

Bibliography

Stevie, F. A., Shane, T. C., Kahora, P. M., Hull, R., Bahnck, D., Kannan, V. C., & David, E. (1995). Applications of focused ion beams in microelectronics production, design and development. Surface and Interface Analysis, 23(2), 61â68. Portico.

Authors 7

F. A. Stevie (first)
T. C. Shane (additional)
P. M. Kahora (additional)
R. Hull (additional)
D. Bahnck (additional)
V. C. Kannan (additional)
E. David (additional)

References 62 Referenced 63

10.1016/0169-4332(89)90939-2
K.Nikawa K.Nasu M.Murase T.Kaito T.AdachiandS.Inoue IEEE/IRPS Proceedings p.43(1989).
10.1117/12.47342
{'key': 'e_1_2_1_5_2', 'first-page': '167', 'volume-title': 'IEEE/IRPS Proc.', 'author': 'Matusiewicz G. R.', 'year': '1991'} / IEEE/IRPS Proc. by Matusiewicz G. R. (1991)
10.1016/0167-9317(93)90051-6
10.1149/1.2056082
10.1016/0042-207X(91)90085-W
{'key': 'e_1_2_1_9_2', 'first-page': '136', 'volume-title': 'Focused Ion Beams from Liquid Metal Ion Sources', 'author': 'Prewett P. D.', 'year': '1991'} / Focused Ion Beams from Liquid Metal Ion Sources by Prewett P. D. (1991)
10.1098/rspa.1964.0151
{'key': 'e_1_2_1_11_2', 'first-page': '123', 'volume': '34', 'author': 'Kingman D. R.', 'year': '1984', 'journal-title': 'Appl. Phys.'} / Appl. Phys. by Kingman D. R. (1984)
10.1007/978-3-642-82724-2_31
10.1116/1.583918
10.1116/1.586708
10.1016/0167-9317(93)90057-C
10.1016/0168-583X(93)90792-5
10.1116/1.584344
10.1116/1.584655
10.1063/1.346140
10.1116/1.586455
10.1116/1.586028
10.1116/1.585167
10.1116/1.585665
10.1116/1.585666
10.1116/1.585319
10.1116/1.586456
{'key': 'e_1_2_1_27_2', 'first-page': '93', 'volume-title': 'Microbeam Analysis', 'author': 'Levi‐Sett R.', 'year': '1988'} / Microbeam Analysis by Levi‐Sett R. (1988)
10.1116/1.584321
10.1557/PROC-101-483
10.1116/1.584712
{'key': 'e_1_2_1_31_2', 'first-page': '859', 'volume-title': 'Secondary Ion Mass Spectrometry, SIMS VII', 'author': 'Vasile M. J.', 'year': '1990'} / Secondary Ion Mass Spectrometry, SIMS VII by Vasile M. J. (1990)
10.1016/0042-207X(91)91821-5
10.1016/0039-6028(91)90399-D
{'key': 'e_1_2_1_34_2', 'first-page': '401', 'volume-title': 'Proc. 17th Int. Symp. for Test and Failure Analysis', 'author': 'Crow G. A.', 'year': '1991'} / Proc. 17th Int. Symp. for Test and Failure Analysis by Crow G. A. (1991)
10.1063/1.107815
10.1143/JJAP.31.L1147
10.1116/1.585941
10.1116/1.577631
10.1116/1.585943
10.1116/1.586999
10.1109/EUASIC.1992.227986
10.1016/0167-9317(89)90138-X
10.1116/1.586668
10.1016/0167-9317(93)90055-A
10.1016/0169-4332(91)90112-W
{'key': 'e_1_2_1_46_2', 'first-page': '91', 'volume-title': 'IEEE/IRPS Proc.', 'author': 'May J. S.', 'year': '1991'} / IEEE/IRPS Proc. by May J. S. (1991)
{'issue': '7', 'key': 'e_1_2_1_47_2', 'first-page': '501', 'volume': '100', 'author': 'Kirk E. C. G.', 'year': '1989', 'journal-title': 'Inst. Phys. Conf. Ser.'} / Inst. Phys. Conf. Ser. by Kirk E. C. G. (1989)
10.1557/PROC-254-23
10.1116/1.586415
10.1143/JJAP.31.L1305
10.1116/1.586536
10.1116/1.586554
10.1116/1.586998
10.1143/JJAP.32.3938
10.1116/1.586840
10.1116/1.586537
{'key': 'e_1_2_1_57_2', 'first-page': '397', 'volume-title': '17th Int. Symp. for Testing and Failure Analysis', 'author': 'Lange J. A.', 'year': '1991'} / 17th Int. Symp. for Testing and Failure Analysis by Lange J. A. (1991)
{'key': 'e_1_2_1_58_2', 'first-page': '239', 'volume-title': 'Mater. Res. Soc. Symp. on Specimen Preparation for Transmission Electron Microscopy of Materials‐III', 'author': 'Sanborn C. E.', 'year': '1992'} / Mater. Res. Soc. Symp. on Specimen Preparation for Transmission Electron Microscopy of Materials‐III by Sanborn C. E. (1992)
{'key': 'e_1_2_1_59_2', 'first-page': '239', 'volume-title': 'Mater. Res. Soc. Symp. on Specimen Preparation for Transmission Electron Microscopy of Materials‐III', 'author': 'Sanborn C. E.', 'year': '1992'} / Mater. Res. Soc. Symp. on Specimen Preparation for Transmission Electron Microscopy of Materials‐III by Sanborn C. E. (1992)
10.1117/12.139343
10.1117/12.139342
10.1063/1.109032
R.Hull F. A.StevieandD.Bahnck Mater. Res. Soc. Symp. Proc.(1994).

Dates

Type	When
Created	20 years, 7 months ago (Dec. 30, 2004, 5:03 p.m.)
Deposited	1 year, 9 months ago (Oct. 26, 2023, 10:34 p.m.)
Indexed	11 months, 1 week ago (Sept. 10, 2024, 8:42 a.m.)
Issued	30 years, 6 months ago (Feb. 1, 1995)
Published	30 years, 6 months ago (Feb. 1, 1995)
Published Online	20 years, 11 months ago (Sept. 15, 2004)
Published Print	30 years, 6 months ago (Feb. 1, 1995)

Funders 0

None

BibTeX

@article{Stevie_1995, title={Applications of focused ion beams in microelectronics production, design and development}, volume={23}, ISSN={1096-9918}, url={http://dx.doi.org/10.1002/sia.740230204}, DOI={10.1002/sia.740230204}, number={2}, journal={Surface and Interface Analysis}, publisher={Wiley}, author={Stevie, F. A. and Shane, T. C. and Kahora, P. M. and Hull, R. and Bahnck, D. and Kannan, V. C. and David, E.}, year={1995}, month=feb, pages={61–68} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2024,
        9,
        10
      ]
    ],
    "date-time": "2024-09-10T12:42:48Z",
    "timestamp": 1725972168166
  },
  "reference-count": 62,
  "publisher": "Wiley",
  "issue": "2",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2004,
            9,
            15
          ]
        ],
        "date-time": "2004-09-15T00:00:00Z",
        "timestamp": 1095206400000
      },
      "content-version": "vor",
      "delay-in-days": 3514,
      "URL": "http://onlinelibrary.wiley.com/termsAndConditions#vor"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1995,
        2
      ]
    ]
  },
  "abstract": "<jats:title>Abstract</jats:title><jats:p>Focused ion beam (FIB) systems using gallium liquid metal ion sources can remove material with a lateral resolution below 50 nm and can produce metal deposition at a similar resolution with ion beam\u2010enhanced chemical vapour deposition. These capabilities have resulted in many valuable applications for the microelectronics industry. Circuit modifications are possible because existing connections can be severed and reconnected to different locations. Testing of circuitry can be enhanced by isolation of specific circuits, removal of overlayers and by creation of probe pads where desired. Grain sizes can be determined from secondary electron images by the delineation of individual grains due to orientation\u2010dependent channeling of the ion beam. Secondary ion mass spectrometry analyses of small areas can provide ion images, elemental identification of small areas and endpoint detection with depth profiles. Scanning electron microscopy and transmission electron microscopy sections are prepared routinely using the FIB. These FIB\u2010prepared sections are notable because specific features, such as defects, can be exposed and a range of materials including silicon, indium phosphide, gallium arsenide and even metal layers can be cut without distortion. Transmission electron micrographs of superior quality have been obtained with a large area of very uniform thickness that permits identification of features such as areas under stress.</jats:p>",
  "DOI": "10.1002/sia.740230204",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2004,
        12,
        30
      ]
    ],
    "date-time": "2004-12-30T22:03:12Z",
    "timestamp": 1104444192000
  },
  "page": "61-68",
  "source": "Crossref",
  "is-referenced-by-count": 63,
  "title": "Applications of focused ion beams in microelectronics production, design and development",
  "prefix": "10.1002",
  "volume": "23",
  "author": [
    {
      "given": "F. A.",
      "family": "Stevie",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "T. C.",
      "family": "Shane",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "P. M.",
      "family": "Kahora",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "R.",
      "family": "Hull",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "D.",
      "family": "Bahnck",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "V. C.",
      "family": "Kannan",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "E.",
      "family": "David",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "311",
  "published-online": {
    "date-parts": [
      [
        2004,
        9,
        15
      ]
    ]
  },
  "reference": [
    {
      "key": "e_1_2_1_2_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0169-4332(89)90939-2"
    },
    {
      "key": "e_1_2_1_3_2",
      "unstructured": "K.Nikawa K.Nasu M.Murase T.Kaito T.AdachiandS.Inoue IEEE/IRPS Proceedings p.43(1989)."
    },
    {
      "key": "e_1_2_1_4_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1117/12.47342"
    },
    {
      "key": "e_1_2_1_5_2",
      "first-page": "167",
      "volume-title": "IEEE/IRPS Proc.",
      "author": "Matusiewicz G. R.",
      "year": "1991"
    },
    {
      "key": "e_1_2_1_6_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0167-9317(93)90051-6"
    },
    {
      "key": "e_1_2_1_7_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1149/1.2056082"
    },
    {
      "key": "e_1_2_1_8_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0042-207X(91)90085-W"
    },
    {
      "key": "e_1_2_1_9_2",
      "first-page": "136",
      "volume-title": "Focused Ion Beams from Liquid Metal Ion Sources",
      "author": "Prewett P. D.",
      "year": "1991"
    },
    {
      "key": "e_1_2_1_10_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1098/rspa.1964.0151"
    },
    {
      "key": "e_1_2_1_11_2",
      "first-page": "123",
      "volume": "34",
      "author": "Kingman D. R.",
      "year": "1984",
      "journal-title": "Appl. Phys."
    },
    {
      "key": "e_1_2_1_12_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1007/978-3-642-82724-2_31"
    },
    {
      "key": "e_1_2_1_13_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.583918"
    },
    {
      "key": "e_1_2_1_14_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586708"
    },
    {
      "key": "e_1_2_1_15_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0167-9317(93)90057-C"
    },
    {
      "key": "e_1_2_1_16_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0168-583X(93)90792-5"
    },
    {
      "key": "e_1_2_1_17_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.584344"
    },
    {
      "key": "e_1_2_1_18_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.584655"
    },
    {
      "key": "e_1_2_1_19_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1063/1.346140"
    },
    {
      "key": "e_1_2_1_20_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586455"
    },
    {
      "key": "e_1_2_1_21_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586028"
    },
    {
      "key": "e_1_2_1_22_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.585167"
    },
    {
      "key": "e_1_2_1_23_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.585665"
    },
    {
      "key": "e_1_2_1_24_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.585666"
    },
    {
      "key": "e_1_2_1_25_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.585319"
    },
    {
      "key": "e_1_2_1_26_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586456"
    },
    {
      "key": "e_1_2_1_27_2",
      "first-page": "93",
      "volume-title": "Microbeam Analysis",
      "author": "Levi\u2010Sett R.",
      "year": "1988"
    },
    {
      "key": "e_1_2_1_28_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.584321"
    },
    {
      "key": "e_1_2_1_29_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1557/PROC-101-483"
    },
    {
      "key": "e_1_2_1_30_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.584712"
    },
    {
      "key": "e_1_2_1_31_2",
      "first-page": "859",
      "volume-title": "Secondary Ion Mass Spectrometry, SIMS VII",
      "author": "Vasile M. J.",
      "year": "1990"
    },
    {
      "key": "e_1_2_1_32_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0042-207X(91)91821-5"
    },
    {
      "key": "e_1_2_1_33_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0039-6028(91)90399-D"
    },
    {
      "key": "e_1_2_1_34_2",
      "first-page": "401",
      "volume-title": "Proc. 17th Int. Symp. for Test and Failure Analysis",
      "author": "Crow G. A.",
      "year": "1991"
    },
    {
      "key": "e_1_2_1_35_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1063/1.107815"
    },
    {
      "key": "e_1_2_1_36_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1143/JJAP.31.L1147"
    },
    {
      "key": "e_1_2_1_37_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.585941"
    },
    {
      "key": "e_1_2_1_38_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.577631"
    },
    {
      "key": "e_1_2_1_39_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.585943"
    },
    {
      "key": "e_1_2_1_40_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586999"
    },
    {
      "key": "e_1_2_1_41_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1109/EUASIC.1992.227986"
    },
    {
      "key": "e_1_2_1_42_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0167-9317(89)90138-X"
    },
    {
      "key": "e_1_2_1_43_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586668"
    },
    {
      "key": "e_1_2_1_44_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0167-9317(93)90055-A"
    },
    {
      "key": "e_1_2_1_45_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1016/0169-4332(91)90112-W"
    },
    {
      "key": "e_1_2_1_46_2",
      "first-page": "91",
      "volume-title": "IEEE/IRPS Proc.",
      "author": "May J. S.",
      "year": "1991"
    },
    {
      "issue": "7",
      "key": "e_1_2_1_47_2",
      "first-page": "501",
      "volume": "100",
      "author": "Kirk E. C. G.",
      "year": "1989",
      "journal-title": "Inst. Phys. Conf. Ser."
    },
    {
      "key": "e_1_2_1_48_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1557/PROC-254-23"
    },
    {
      "key": "e_1_2_1_49_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586415"
    },
    {
      "key": "e_1_2_1_50_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1143/JJAP.31.L1305"
    },
    {
      "key": "e_1_2_1_51_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586536"
    },
    {
      "key": "e_1_2_1_52_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586554"
    },
    {
      "key": "e_1_2_1_53_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586998"
    },
    {
      "key": "e_1_2_1_54_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1143/JJAP.32.3938"
    },
    {
      "key": "e_1_2_1_55_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586840"
    },
    {
      "key": "e_1_2_1_56_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1116/1.586537"
    },
    {
      "key": "e_1_2_1_57_2",
      "first-page": "397",
      "volume-title": "17th Int. Symp. for Testing and Failure Analysis",
      "author": "Lange J. A.",
      "year": "1991"
    },
    {
      "key": "e_1_2_1_58_2",
      "first-page": "239",
      "volume-title": "Mater. Res. Soc. Symp. on Specimen Preparation for Transmission Electron Microscopy of Materials\u2010III",
      "author": "Sanborn C. E.",
      "year": "1992"
    },
    {
      "key": "e_1_2_1_59_2",
      "first-page": "239",
      "volume-title": "Mater. Res. Soc. Symp. on Specimen Preparation for Transmission Electron Microscopy of Materials\u2010III",
      "author": "Sanborn C. E.",
      "year": "1992"
    },
    {
      "key": "e_1_2_1_60_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1117/12.139343"
    },
    {
      "key": "e_1_2_1_61_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1117/12.139342"
    },
    {
      "key": "e_1_2_1_62_2",
      "doi-asserted-by": "publisher",
      "DOI": "10.1063/1.109032"
    },
    {
      "key": "e_1_2_1_63_2",
      "unstructured": "R.Hull F. A.StevieandD.Bahnck Mater. Res. Soc. Symp. Proc.(1994)."
    }
  ],
  "container-title": "Surface and Interface Analysis",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://api.wiley.com/onlinelibrary/tdm/v1/articles/10.1002%2Fsia.740230204",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://onlinelibrary.wiley.com/doi/full/10.1002/sia.740230204",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2023,
        10,
        27
      ]
    ],
    "date-time": "2023-10-27T02:34:34Z",
    "timestamp": 1698374074000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://analyticalsciencejournals.onlinelibrary.wiley.com/doi/10.1002/sia.740230204"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1995,
        2
      ]
    ]
  },
  "references-count": 62,
  "journal-issue": {
    "issue": "2",
    "published-print": {
      "date-parts": [
        [
          1995,
          2
        ]
      ]
    }
  },
  "alternative-id": [
    "10.1002/sia.740230204"
  ],
  "URL": "http://dx.doi.org/10.1002/sia.740230204",
  "relation": {},
  "ISSN": [
    "0142-2421",
    "1096-9918"
  ],
  "subject": [],
  "container-title-short": "Surface &amp; Interface Analysis",
  "published": {
    "date-parts": [
      [
        1995,
        2
      ]
    ]
  }
}