Abstract
AbstractCharacterization of the oxide formed on a Ni‐based alloy (Inconel 600) at high temperatures has been carried out using AES and SAM combined with ion‐etched depth profiling. The oxidation experiment was done at 1000 °C, in atmospheric air and under mild (H2/H2O) oxidation conditions. In air, the resulting surface is highly inhomogeneous, featuring large Ni‐rich islands on top of a continuous Cr‐rich oxide layer. When the oxygen partial pressure (H2/H2O) was lowered, the Ni‐rich layer was not formed.
References
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Dates
Type | When |
---|---|
Created | 20 years, 3 months ago (May 28, 2005, 8 a.m.) |
Deposited | 2 years ago (Aug. 31, 2023, 12:44 a.m.) |
Indexed | 1 year, 10 months ago (Oct. 25, 2023, 2:19 p.m.) |
Issued | 31 years, 2 months ago (July 1, 1994) |
Published | 31 years, 2 months ago (July 1, 1994) |
Published Online | 20 years, 11 months ago (Sept. 15, 2004) |
Published Print | 31 years, 2 months ago (July 1, 1994) |
@article{Alstrup_1994, title={AES and SAM studies of oxide formation on Inconel 600 at high temperatures}, volume={22}, ISSN={1096-9918}, url={http://dx.doi.org/10.1002/sia.740220194}, DOI={10.1002/sia.740220194}, number={1–12}, journal={Surface and Interface Analysis}, publisher={Wiley}, author={Alstrup, N. C. and Langvad, N. and Chorkendorff, I.}, year={1994}, month=jul, pages={441–444} }