Abstract
AbstractWe have investigated adsorption of organic impurities in ultrapure water (UPW) on hydrophilic silicon wafer surface. The primary and tertiary amine molecules used as model compounds of organic impurities were adsorbed on the clean wafer surface during soaking in UPW. It was found that adsorbed quantities of relatively large tertiary amines among water‐soluble amines, such as (C3H7)3N and (C4H9)3N, were higher at relatively short soak time (two h in this experiment) than at longer one (24 h). Time‐of‐flight secondary‐ion mass spectrometry (ToF‐SIMS) is a very powerful tool for identification of trace organic contamination on wafer surface after UPW rinse from the studies of adsorption of the molecules present in UPW. Copyright © 2006 John Wiley & Sons, Ltd.
References
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Referenced
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{'key': 'e_1_2_1_4_2', 'first-page': '229', 'volume-title': 'SIMS XI', 'author': 'Karen A', 'year': '1998'}
/ SIMS XI by Karen A (1998){'key': 'e_1_2_1_5_2', 'first-page': '203', 'volume': '541', 'author': 'Karen A', 'year': '2003', 'journal-title': 'Appl. Surf. Sci.'}
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Dates
Type | When |
---|---|
Created | 19 years, 5 months ago (March 29, 2006, 6:29 a.m.) |
Deposited | 1 year, 10 months ago (Oct. 17, 2023, 10:58 a.m.) |
Indexed | 1 year, 10 months ago (Oct. 18, 2023, 1:24 a.m.) |
Issued | 19 years, 5 months ago (March 29, 2006) |
Published | 19 years, 5 months ago (March 29, 2006) |
Published Online | 19 years, 5 months ago (March 29, 2006) |
Published Print | 19 years, 5 months ago (April 1, 2006) |
@article{Kobayashi_2006, title={ToF‐SIMS analysis of organic impurities in UPW}, volume={38}, ISSN={1096-9918}, url={http://dx.doi.org/10.1002/sia.2204}, DOI={10.1002/sia.2204}, number={4}, journal={Surface and Interface Analysis}, publisher={Wiley}, author={Kobayashi, Junji and Owari, Masanori}, year={2006}, month=mar, pages={305–308} }