DOI: 10.1002/pen.760120206. Ultraviolet depolymerization of photoresist polymers

Ultraviolet depolymerization of photoresist polymers

10.1002/pen.760120206

Crossref journal-article

Wiley

Polymer Engineering & Science (311)

Abstract

AbstractA new method for removal of thin films of photoresist polymers has been found. When polymeric films are exposed to ultraviolet light in the presence of air, the material can be removed leaving an extremely clean surface, free of carbonaceous material. This process has been examined for a variety of photoresist polymers as well as on nonphotoresist polymers and on a variety of substrates. The process offers a new method of photoresist removal.

Bibliography

Bolon, D. A., & Kunz, C. O. (1972). Ultraviolet depolymerization of photoresist polymers. Polymer Engineering & Science, 12(2), 109â111. Portico.

Authors 2

D. A. Bolon (first)
C. O. Kunz (additional)

References 5 Referenced 58

10.1038/215953a0
A. N.Wright C. O.Kunz andP. C.Long paper given at Society of Plastics Engineers Regional Technical Conference Ellenville N. Y. Oct. 15‐16 (1970).
10.1002/pol.1970.110080207
10.1002/pol.1970.150080418
10.1063/1.1656374

Dates

Type	When
Created	20 years, 7 months ago (Dec. 28, 2004, 7:13 p.m.)
Deposited	1 year, 9 months ago (Nov. 1, 2023, 4 a.m.)
Indexed	1 month, 4 weeks ago (June 25, 2025, 8:10 p.m.)
Issued	53 years, 5 months ago (March 1, 1972)
Published	53 years, 5 months ago (March 1, 1972)
Published Online	20 years, 11 months ago (Aug. 25, 2004)
Published Print	53 years, 5 months ago (March 1, 1972)

Funders 0

None

BibTeX

@article{Bolon_1972, title={Ultraviolet depolymerization of photoresist polymers}, volume={12}, ISSN={1548-2634}, url={http://dx.doi.org/10.1002/pen.760120206}, DOI={10.1002/pen.760120206}, number={2}, journal={Polymer Engineering & Science}, publisher={Wiley}, author={Bolon, D. A. and Kunz, C. O.}, year={1972}, month=mar, pages={109–111} }

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