Abstract
AbstractReflection electron microscope studies of surface dynamic processes are reviewed and illustrated with recent new observations. They include: surface electromigration and current dependent structures of Si surfaces; surface etching by oxidation of Si surface; and growth of two dimensional alloyed adsorbate by co‐deposition of metals on Si surface. The observations revealed details of the surface dynamic processes, which are difficult to obtain with other surface analysis techniques.
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Dates
Type | When |
---|---|
Created | 20 years, 6 months ago (Feb. 23, 2005, 5:50 p.m.) |
Deposited | 1 year, 10 months ago (Oct. 23, 2023, 7:19 p.m.) |
Indexed | 1 year, 10 months ago (Oct. 24, 2023, 7:42 a.m.) |
Issued | 33 years, 6 months ago (Feb. 15, 1992) |
Published | 33 years, 6 months ago (Feb. 15, 1992) |
Published Online | 20 years, 6 months ago (Feb. 4, 2005) |
Published Print | 33 years, 6 months ago (Feb. 15, 1992) |
@article{Yagi_1992, title={Recent studies of surface dynamic processes by reflection electron microscopy}, volume={20}, ISSN={1097-0029}, url={http://dx.doi.org/10.1002/jemt.1070200404}, DOI={10.1002/jemt.1070200404}, number={4}, journal={Microscopy Research and Technique}, publisher={Wiley}, author={Yagi, Katsumichi and Yamanaka, Akira and Homma, Itsuro}, year={1992}, month=feb, pages={333–340} }