DOI: 10.1002/cvde.19960020104. Atmospheric pressure chemical vapor deposition of SiO2‐TiO2 antireflective films from [tri‐(tert‐butoxy)siloxy‐tri‐(tert‐butoxy)]titanium, [tC4H9O]3Si‐O‐Ti[OtC4H9]3, which is a single source alkoxide precursor

Atmospheric pressure chemical vapor deposition of SiO2‐TiO2 antireflective films from [tri‐(tert‐butoxy)siloxy‐tri‐(tert‐butoxy)]titanium, [tC4H9O]3Si‐O‐Ti[OtC4H9]3, which is a single source alkoxide precursor

10.1002/cvde.19960020104

Crossref journal-article

Wiley

Chemical Vapor Deposition (311)

Abstract

Antireflective SiO2‐TiO2 films have potential applications in the automotive industry provided an economical method can be found to produce high‐quality films on a large scale. Following the discovery that alkoxides MOM' can be suitable single‐source precursors for the deposition of multicomponent oxides, the preparation of tC4H9O[3SiOTiOtC4H9]4 is described along with its application as a single‐source precursor for the deposition of SiO2 and TiO2 films via atmospheric‐pressure CVD.

Bibliography

Narula, C. K., Varshney, A., & Riaz, U. (1996). Atmospheric pressure chemical vapor deposition of SiO2âTiO2 antireflective films from [triâ(tertâbutoxy)siloxyâtriâ(tertâbutoxy)]titanium, [tC4H9O]3SiâOâTi[OtC4H9]3, which is a single source alkoxide precursor. Chemical Vapor Deposition, 2(1), 13â15. Portico.

Authors 3

Chaitanya K. Narula (first)
Ashima Varshney (additional)
Umar Riaz (additional)

References 25 Referenced 12

{'key': 'e_1_2_1_1_2', 'volume-title': 'Chemical Vapor Deposition of Refractory Metals and Ceramics III', 'author': 'Lee W. Y.', 'year': '1995'} / Chemical Vapor Deposition of Refractory Metals and Ceramics III by Lee W. Y. (1995)
{'key': 'e_1_2_1_1_3', 'volume-title': 'Metal‐organic Chemical Vapor Deposition of Electronic Ceramics', 'author': 'Desu S. B.', 'year': '1994'} / Metal‐organic Chemical Vapor Deposition of Electronic Ceramics by Desu S. B. (1994)
{'key': 'e_1_2_1_1_4', 'volume-title': 'Ceramic Thin and Thick Films', 'author': 'Hiremath B. V.', 'year': '1990'} / Ceramic Thin and Thick Films by Hiremath B. V. (1990)
{'key': 'e_1_2_1_2_2', 'volume-title': 'Metal Alkoxides', 'author': 'Bradley D. C.', 'year': '1978'} / Metal Alkoxides by Bradley D. C. (1978)
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{'key': 'e_1_2_1_4_2', 'volume-title': 'Sol–gel Science, The Physics and Chemistry of Sol–gel Processing', 'author': 'Briker C. J.', 'year': '1990'} / Sol–gel Science, The Physics and Chemistry of Sol–gel Processing by Briker C. J. (1990)
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{'key': 'e_1_2_1_8_2', 'first-page': '803', 'volume': '81', 'author': 'Sanchez Q. F.', 'year': '1987', 'journal-title': 'Rev. R. Acad. Cienc. Exactas, Fis. Nat. Madrid'} / Rev. R. Acad. Cienc. Exactas, Fis. Nat. Madrid by Sanchez Q. F. (1987)
10.1016/0042-207X(91)90077-V
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{'key': 'e_1_2_1_9_3', 'volume': '1270', 'author': 'Zoeller A.', 'year': '1990', 'journal-title': 'Proc. SPIE‐ Int. Soc. Opt. Eng'} / Proc. SPIE‐ Int. Soc. Opt. Eng by Zoeller A. (1990)
{'key': 'e_1_2_1_10_2', 'volume': '752', 'author': 'Farabaugh E. N.', 'year': '1988', 'journal-title': 'NIST Spec. Publ.'} / NIST Spec. Publ. by Farabaugh E. N. (1988)
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{'key': 'e_1_2_1_17_2', 'first-page': '1174', 'volume': '61', 'author': 'Zeiteler V. A.', 'year': '1957', 'journal-title': 'J. Am. Chem. Soc.'} / J. Am. Chem. Soc. by Zeiteler V. A. (1957)

Dates

Type	When
Created	20 years, 3 months ago (May 29, 2005, 4:22 a.m.)
Deposited	1 year, 10 months ago (Oct. 26, 2023, 3:02 p.m.)
Indexed	1 year, 2 months ago (June 23, 2024, 10:09 p.m.)
Issued	29 years, 7 months ago (Jan. 1, 1996)
Published	29 years, 7 months ago (Jan. 1, 1996)
Published Online	20 years, 10 months ago (Oct. 4, 2004)
Published Print	29 years, 7 months ago (Jan. 1, 1996)

Funders 0

None

BibTeX

@article{Narula_1996, title={Atmospheric pressure chemical vapor deposition of SiO2‐TiO2 antireflective films from [tri‐(tert‐butoxy)siloxy‐tri‐(tert‐butoxy)]titanium, [tC4H9O]3Si‐O‐Ti[OtC4H9]3, which is a single source alkoxide precursor}, volume={2}, ISSN={1521-3862}, url={http://dx.doi.org/10.1002/cvde.19960020104}, DOI={10.1002/cvde.19960020104}, number={1}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Narula, Chaitanya K. and Varshney, Ashima and Riaz, Umar}, year={1996}, month=jan, pages={13–15} }

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