DOI: 10.1002/crat.2170210315. Dry Patterning of Al and Al Alloys

10.1002/crat.2170210315

Crossref journal-article

Wiley

Crystal Research and Technology (311)

Abstract

AbstractPlasmachemical etching of Aluminium in chlorine containing discharges is discussed from a thermochemical point of view. A model of Al etching is proposed, in which diffusion of reaction products through the carbon‐rich deposite layer is considered to be rate‐limiting. The model quantitatively describes the dependence of the etch reaction on different process parameters of the CCl4‐plasma.

Bibliography

Sameith, D., Tiller, H. âJ., & Breitbarth, F. âW. (1986). Dry Patterning of Al and Al Alloys. Crystal Research and Technology, 21(3), 407â412. Portico.

Authors 3

D. Sameith (first)
H.‐J. Tiller (additional)
F.‐W. Breitbarth (additional)

References 13 Referenced 2

Barin I. Knacke D.:Thermochemical properties of inorganic substances Berlin—Heidelberg—New York1973
Curtis D. J. Brunner H. R.:5th Int. Symp. Plasma Chemistry Edinburgh 1981 Symp. Proc.Vol. 1 318
Gmelins:Gmelins‐Handbuch d. anorgan. Chemie 8. Aufl. System Nr. 35 Aluminium Teil B Weinheim—Berlin1959
10.1063/1.331433
10.1007/BF00633130
{'key': 'e_1_2_1_7_1', 'first-page': '721', 'volume-title': 'Methoden der organischen Chemie', 'author': 'Houben‐Weyl', 'year': '1960'} / Methoden der organischen Chemie by Houben‐Weyl (1960)
{'key': 'e_1_2_1_8_1', 'series-title': 'Nat. Stand. Ref. Data Ser., Nat. Bur. Stand. (US)', 'first-page': '37', 'volume-title': 'Janaf: Thermochemical tables', 'year': '1971'} / Janaf: Thermochemical tables / Nat. Stand. Ref. Data Ser., Nat. Bur. Stand. (US) (1971)
{'key': 'e_1_2_1_9_1', 'volume': '129', 'author': 'Nagy A. G.', 'year': '1982', 'journal-title': 'J. Electrochem. Soc.'} / J. Electrochem. Soc. by Nagy A. G. (1982)
10.1016/B978-0-12-234102-1.50008-5
{'key': 'e_1_2_1_11_1', 'first-page': '145', 'volume': '33', 'author': 'Tiller H.‐J.', 'year': '1984', 'journal-title': 'Wiss. Zeitschr. Fr.‐Schiller‐Univ. Naturwiss. R.'} / Wiss. Zeitschr. Fr.‐Schiller‐Univ. Naturwiss. R. by Tiller H.‐J. (1984)
10.1002/crat.19810161119
10.1351/pac198052071759
{'key': 'e_1_2_1_14_1', 'volume': '69', 'author': 'Weiss A.', 'year': '1982', 'journal-title': 'Semiconductor Int.'} / Semiconductor Int. by Weiss A. (1982)

Dates

Type	When
Created	18 years, 7 months ago (Jan. 13, 2007, 7:49 a.m.)
Deposited	1 year, 10 months ago (Oct. 20, 2023, 6:40 p.m.)
Indexed	1 year, 10 months ago (Oct. 21, 2023, 7:13 a.m.)
Issued	39 years, 6 months ago (March 1, 1986)
Published	39 years, 6 months ago (March 1, 1986)
Published Online	19 years, 6 months ago (Feb. 19, 2006)
Published Print	39 years, 6 months ago (March 1, 1986)

Funders 0

None

BibTeX

@article{Sameith_1986, title={Dry Patterning of Al and Al Alloys}, volume={21}, ISSN={1521-4079}, url={http://dx.doi.org/10.1002/crat.2170210315}, DOI={10.1002/crat.2170210315}, number={3}, journal={Crystal Research and Technology}, publisher={Wiley}, author={Sameith, D. and Tiller, H.‐J. and Breitbarth, F.‐W.}, year={1986}, month=mar, pages={407–412} }

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