DOI: 10.1002/app.1973.070171022. Electron irradiation of poly(olefin sulfones). Application to electron beam resists

Electron irradiation of poly(olefin sulfones). Application to electron beam resists

10.1002/app.1973.070171022

Crossref journal-article

Wiley

Journal of Applied Polymer Science (311)

Abstract

AbstractAll the poly(olefin sulfones) examined degraded rapidly under electron irradiation. The dose required to effect a molecular weight distribution completely separated from the original distribution as required for fractional solution development was similar for all polymers, viz., 1–2 × 10−6 coulomb/cm2. This indicates that they all have similar values for G(scission). The film thickness of the exposed area decreased at a rate dependent on olefin structure and temperature. This process, termed vapor development, has been attributed to concurrent chain scission and depolymerization. Factors determining the rate of depropagation are discussed.

Bibliography

Bowden, M. J., & Thompson, L. F. (1973). Electron irradiation of poly(olefin sulfones). Application to electron beam resists. Journal of Applied Polymer Science, 17(10), 3211â3221. Portico.

Authors 2

M. J. Bowden (first)
L. F. Thompson (additional)

References 18 Referenced 69

10.1147/rd.156.0446
{'key': 'e_1_2_1_3_2', 'volume-title': 'Hand Book of Thin Film Technology', 'author': 'Glang R.', 'year': '1970'} / Hand Book of Thin Film Technology by Glang R. (1970)
10.1149/1.2408138
10.1149/1.2412288
10.1147/rd.123.0251
{'key': 'e_1_2_1_7_2', 'first-page': '338', 'volume-title': 'Atomic Radiation and Polymers', 'author': 'Charlesby A.', 'year': '1960'} / Atomic Radiation and Polymers by Charlesby A. (1960)
10.1021/ma60026a001
10.1098/rspa.1952.0068
L. F.ThompsonandM. J.Bowden J. Electrochem. Soc. in press.
10.1016/0032-3861(62)90070-8
10.1149/1.2412194
{'key': 'e_1_2_1_13_2', 'first-page': '335', 'volume': '1', 'author': 'Ivin K. J.', 'year': '1968', 'journal-title': 'Advan. Macromol. Chem.'} / Advan. Macromol. Chem. by Ivin K. J. (1968)
10.1039/tf9555101273
10.1002/pol.1972.150100710
R. D.Heidenreich L. F.Thompson andM. J.Bowden to be published.
10.1002/pol.1958.1202912019
10.1039/tf9595500262
10.1039/qr9581200061

Dates

Type	When
Created	22 years, 4 months ago (April 14, 2003, 6:05 p.m.)
Deposited	1 year, 11 months ago (Oct. 1, 2023, 4:12 p.m.)
Indexed	1 week, 5 days ago (Aug. 21, 2025, 1:26 p.m.)
Issued	51 years, 11 months ago (Oct. 1, 1973)
Published	51 years, 11 months ago (Oct. 1, 1973)
Published Online	22 years, 5 months ago (March 9, 2003)
Published Print	51 years, 11 months ago (Oct. 1, 1973)

Funders 0

None

BibTeX

@article{Bowden_1973, title={Electron irradiation of poly(olefin sulfones). Application to electron beam resists}, volume={17}, ISSN={1097-4628}, url={http://dx.doi.org/10.1002/app.1973.070171022}, DOI={10.1002/app.1973.070171022}, number={10}, journal={Journal of Applied Polymer Science}, publisher={Wiley}, author={Bowden, M. J. and Thompson, L. F.}, year={1973}, month=oct, pages={3211–3221} }

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