DOI: 10.1002/aenm.201400610. Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

10.1002/aenm.201400610

Crossref journal-article

Wiley

Advanced Energy Materials (311)

Bibliography

Park, M. H., Kim, H. J., Kim, Y. J., Moon, T., Kim, K. D., & Hwang, C. S. (2014). Thin HfxZr1âxO2 Films: A New LeadâFree System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability. Advanced Energy Materials, 4(16). Portico.

Authors 6

Min Hyuk Park (first)
Han Joon Kim (additional)
Yu Jin Kim (additional)
Taehwan Moon (additional)
Keum Do Kim (additional)
Cheol Seong Hwang (additional)

References 22 Referenced 316

Dates

Type	When
Created	11 years, 1 month ago (July 2, 2014, 3:56 a.m.)
Deposited	1 year, 10 months ago (Oct. 10, 2023, 8:59 a.m.)
Indexed	2 weeks, 1 day ago (Aug. 6, 2025, 8:30 a.m.)
Issued	11 years, 1 month ago (July 1, 2014)
Published	11 years, 1 month ago (July 1, 2014)
Published Online	11 years, 1 month ago (July 1, 2014)
Published Print	10 years, 9 months ago (Nov. 1, 2014)

Funders 0

None

BibTeX

@article{Park_2014, title={Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability}, volume={4}, ISSN={1614-6840}, url={http://dx.doi.org/10.1002/aenm.201400610}, DOI={10.1002/aenm.201400610}, number={16}, journal={Advanced Energy Materials}, publisher={Wiley}, author={Park, Min Hyuk and Kim, Han Joon and Kim, Yu Jin and Moon, Taehwan and Kim, Keum Do and Hwang, Cheol Seong}, year={2014}, month=jul }

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