Abstract
Abstract2D metallic transition metal dichalcogenides (MTMDCs) are benchmark systems for uncovering the dimensionality effect on fascinating quantum physics, such as charge‐density‐wave (CDW) order, unconventional superconductivity, and magnetism, etc. However, the scalable and thickness‐tunable syntheses of such envisioned MTMDCs are still challenging. Meanwhile, the origin of CDW order at the 2D limit is controversial. Herein, the direct synthesis of wafer‐scale uniform monolayer 2H‐TaSe2 films and thickness‐tunable flakes on Au foils by chemical vapor deposition is accomplished. Based on the thickness‐tunable 2H‐TaSe2, the robust periodic lattice distortions that relate to CDW orders by low‐temperature transmission electron microscopy are directly visualized. Particularly, a phase diagram of the transition temperature from normal metallic to CDW phases with thickness by variable‐temperature Raman characterizations is established. Intriguingly, dramatically enhanced transition temperature from bulk value ≈90 to ≈125 K is observed from monolayer 2H‐TaSe2, which can be explained by the enhanced electron–phonon coupling mechanism. More importantly, an ultrahigh specific capacitance is also obtained for the as‐grown TaSe2 on carbon cloth as supercapacitor electrodes. The results hereby open up novel avenues toward the large‐scale preparation of high‐quality MTMDCs, and shed light on their applications in exploring some fundamental issues.
Bibliography
Shi, J., Chen, X., Zhao, L., Gong, Y., Hong, M., Huan, Y., Zhang, Z., Yang, P., Li, Y., Zhang, Q., Zhang, Q., Gu, L., Chen, H., Wang, J., Deng, S., Xu, N., & Zhang, Y. (2018). Chemical Vapor Deposition Grown WaferâScale 2D Tantalum Diselenide with Robust ChargeâDensityâWave Order. Advanced Materials, 30(44). Portico.
Authors
17
- Jianping Shi (first)
- Xuexian Chen (additional)
- Liyun Zhao (additional)
- Yue Gong (additional)
- Min Hong (additional)
- Yahuan Huan (additional)
- Zhepeng Zhang (additional)
- Pengfei Yang (additional)
- Yong Li (additional)
- Qinghua Zhang (additional)
- Qing Zhang (additional)
- Lin Gu (additional)
- Huanjun Chen (additional)
- Jian Wang (additional)
- Shaozhi Deng (additional)
- Ningsheng Xu (additional)
- Yanfeng Zhang (additional)
References
49
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Dates
Type | When |
---|---|
Created | 6 years, 11 months ago (Sept. 16, 2018, 5:23 a.m.) |
Deposited | 1 year, 11 months ago (Sept. 16, 2023, 4:58 p.m.) |
Indexed | 1 week, 4 days ago (Aug. 12, 2025, 6:15 p.m.) |
Issued | 6 years, 11 months ago (Sept. 14, 2018) |
Published | 6 years, 11 months ago (Sept. 14, 2018) |
Published Online | 6 years, 11 months ago (Sept. 14, 2018) |
Published Print | 6 years, 9 months ago (Nov. 1, 2018) |
Funders
5
National Natural Science Foundation of China
10.13039/501100001809
Region: Asia
gov (National government)
Labels
11
- Chinese National Science Foundation
- Natural Science Foundation of China
- National Science Foundation of China
- NNSF of China
- NSF of China
- 国家自然科学基金委员会
- National Nature Science Foundation of China
- Guójiā Zìrán Kēxué Jījīn Wěiyuánhuì
- NSFC
- NNSF
- NNSFC
Awards
9
- 51672307
- 51861135201
- 11774008
- 51290271
- 51472008
- 11474364
- 51290272
- 51421002
- 51522212
China Postdoctoral Science Foundation
10.13039/501100002858
Region: Asia
gov (Trusts, charities, foundations (both public and private))
Labels
1
- China Postdoctoral Foundation Project
Awards
1
- 2018M631252
Chinese Academy of Sciences
10.13039/501100002367
Region: Asia
gov (Universities (academic only))
Labels
3
- 中国科学院
- Academia Sinica
- CAS
Awards
1
- XDB07030200
Chinese Academy of Sciences
10.13039/501100002367
Region: Asia
gov (Universities (academic only))
Labels
3
- 中国科学院
- Academia Sinica
- CAS
Awards
1
- QYZDB‐SSW‐JSC035
Chinese Academy of Sciences
10.13039/501100002367
Region: Asia
gov (Universities (academic only))
Labels
3
- 中国科学院
- Academia Sinica
- CAS
Awards
1
- XDPB08‐2
@article{Shi_2018, title={Chemical Vapor Deposition Grown Wafer‐Scale 2D Tantalum Diselenide with Robust Charge‐Density‐Wave Order}, volume={30}, ISSN={1521-4095}, url={http://dx.doi.org/10.1002/adma.201804616}, DOI={10.1002/adma.201804616}, number={44}, journal={Advanced Materials}, publisher={Wiley}, author={Shi, Jianping and Chen, Xuexian and Zhao, Liyun and Gong, Yue and Hong, Min and Huan, Yahuan and Zhang, Zhepeng and Yang, Pengfei and Li, Yong and Zhang, Qinghua and Zhang, Qing and Gu, Lin and Chen, Huanjun and Wang, Jian and Deng, Shaozhi and Xu, Ningsheng and Zhang, Yanfeng}, year={2018}, month=sep }