Crossref journal-article
Wiley
Advanced Materials (311)
Bibliography

Lu, H., Liu, X., Burton, J. D., Bark, C. ‐W., Wang, Y., Zhang, Y., Kim, D. J., Stamm, A., Lukashev, P., Felker, D. A., Folkman, C. M., Gao, P., Rzchowski, M. S., Pan, X. Q., Eom, C. ‐B., Tsymbal, E. Y., & Gruverman, A. (2012). Enhancement of Ferroelectric Polarization Stability by Interface Engineering. Advanced Materials, 24(9), 1209–1216. Portico.

Authors 17
  1. H. Lu (first)
  2. X. Liu (additional)
  3. J. D. Burton (additional)
  4. C.‐W. Bark (additional)
  5. Y. Wang (additional)
  6. Y. Zhang (additional)
  7. D. J. Kim (additional)
  8. A. Stamm (additional)
  9. P. Lukashev (additional)
  10. D. A. Felker (additional)
  11. C. M. Folkman (additional)
  12. P. Gao (additional)
  13. M. S. Rzchowski (additional)
  14. X. Q. Pan (additional)
  15. C.‐B. Eom (additional)
  16. E. Y. Tsymbal (additional)
  17. A. Gruverman (additional)
References 36 Referenced 133
  1. 10.1007/978-3-662-04307-3
  2. 10.1146/annurev.matsci.30.1.263
  3. 10.1126/science.1092508
  4. 10.1126/science.1126230
  5. 10.1103/PhysRevLett.94.246802
  6. 10.1103/PhysRevB.72.125341
  7. 10.1038/nature08128
  8. 10.1021/nl901754t
  9. 10.1063/1.2138365
  10. 10.1021/nl803318d
  11. 10.1126/science.1184028
  12. 10.1038/nature01501
  13. 10.1103/PhysRevLett.94.047603
  14. 10.1103/PhysRevLett.96.127601
  15. 10.1103/PhysRevLett.89.067601
  16. 10.1126/science.1098252
  17. 10.1103/PhysRevLett.96.137602
  18. 10.1103/PhysRevLett.100.177601
  19. 10.1063/1.2337363
  20. 10.1103/PhysRevB.63.125411
  21. 10.1103/PhysRevLett.95.237602
  22. 10.1063/1.2337009
  23. 10.1021/nl052452l
  24. 10.1038/nmat2429
  25. 10.1103/PhysRevLett.98.207601
  26. 10.1073/pnas.0710928105
  27. 10.1002/adma.201004641
  28. 10.1103/PhysRevB.20.1065
  29. X.Liu Y.Wang P. V.Lukashev J. D.Burton E. Y.Tsymbal The interface dipole effect on thin‐film ferroelectric stability: First‐principles and phenomenological modeling submitted.
  30. 10.1126/science.1103218
  31. 10.1126/science.258.5089.1766
  32. {'key': 'e_1_2_5_32_2', 'first-page': '277', 'volume': '38', 'author': 'Chang D. H.', 'year': '2001', 'journal-title': 'J. Korean Phys. Soc.'} / J. Korean Phys. Soc. by Chang D. H. (2001)
  33. 10.1080/14786445108561354
  34. 10.1063/1.2905266
  35. 10.1103/PhysRevLett.103.177601
  36. No sign of the EFM signal decay over the period of several hours has been detected suggesting high stability of the polarization states.
Dates
Type When
Created 13 years, 6 months ago (Jan. 26, 2012, 4:24 a.m.)
Deposited 1 year, 10 months ago (Oct. 11, 2023, 11:16 a.m.)
Indexed 1 month, 4 weeks ago (June 24, 2025, 4:23 a.m.)
Issued 13 years, 6 months ago (Jan. 26, 2012)
Published 13 years, 6 months ago (Jan. 26, 2012)
Published Online 13 years, 6 months ago (Jan. 26, 2012)
Published Print 13 years, 5 months ago (March 2, 2012)
Funders 0

None

@article{Lu_2012, title={Enhancement of Ferroelectric Polarization Stability by Interface Engineering}, volume={24}, ISSN={1521-4095}, url={http://dx.doi.org/10.1002/adma.201104398}, DOI={10.1002/adma.201104398}, number={9}, journal={Advanced Materials}, publisher={Wiley}, author={Lu, H. and Liu, X. and Burton, J. D. and Bark, C.‐W. and Wang, Y. and Zhang, Y. and Kim, D. J. and Stamm, A. and Lukashev, P. and Felker, D. A. and Folkman, C. M. and Gao, P. and Rzchowski, M. S. and Pan, X. Q. and Eom, C.‐B. and Tsymbal, E. Y. and Gruverman, A.}, year={2012}, month=jan, pages={1209–1216} }