DOI: 10.1002/adma.201000436. Making Patterns on Graphene

10.1002/adma.201000436

Crossref journal-article

Wiley

Advanced Materials (311)

Abstract

AbstractGraphene‐based nanostructures are considered as promising alternatives to silicon‐based mesostructures in future electronic nanodevices. The lithographical patterning of graphene, which are essential steps in any form of microelectronic processing, present interesting challenges because of the atomic layer thickness of graphene. Mesoscopic devices based on graphene require high spatial resolution patterning that will induce as little damage as possible. This research news highlights and evaluates recent developments in the nanostructuring and patterning of graphene.

Bibliography

Zhou, Y., & Loh, K. P. (2010). Making Patterns on Graphene. Advanced Materials, 22(32), 3615â3620. Portico.

Authors 2

Yong Zhou (first)
Kian Ping Loh (additional)

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Dates

Type	When
Created	15 years, 2 months ago (June 8, 2010, 7:23 a.m.)
Deposited	1 year, 10 months ago (Oct. 11, 2023, 6:54 p.m.)
Indexed	1 year ago (July 22, 2024, 11:09 a.m.)
Issued	15 years, 2 months ago (June 8, 2010)
Published	15 years, 2 months ago (June 8, 2010)
Published Online	15 years, 2 months ago (June 8, 2010)
Published Print	14 years, 11 months ago (Aug. 24, 2010)

Funders 0

None

BibTeX

@article{Zhou_2010, title={Making Patterns on Graphene}, volume={22}, ISSN={1521-4095}, url={http://dx.doi.org/10.1002/adma.201000436}, DOI={10.1002/adma.201000436}, number={32}, journal={Advanced Materials}, publisher={Wiley}, author={Zhou, Yong and Loh, Kian Ping}, year={2010}, month=jun, pages={3615–3620} }

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