DOI: 10.1002/adma.200401192. Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers

Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers

10.1002/adma.200401192

Crossref journal-article

Wiley

Advanced Materials (311)

Bibliography

Cheng, X., Guo, L. J., & Fu, P. âF. (2005). RoomâTemperature, LowâPressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers. Advanced Materials, 17(11), 1419â1424. Portico.

Authors 3

X. Cheng (first)
L. J. Guo (additional)
P.‐F. Fu (additional)

References 37 Referenced 84

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Dates

Type	When
Created	20 years, 3 months ago (May 24, 2005, 11:27 a.m.)
Deposited	1 year, 11 months ago (Aug. 29, 2023, 3:22 p.m.)
Indexed	5 days, 16 hours ago (Aug. 23, 2025, 1:01 a.m.)
Issued	20 years, 3 months ago (May 24, 2005)
Published	20 years, 3 months ago (May 24, 2005)
Published Online	20 years, 3 months ago (May 24, 2005)
Published Print	20 years, 2 months ago (June 6, 2005)

Funders 0

None

BibTeX

@article{Cheng_2005, title={Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers}, volume={17}, ISSN={1521-4095}, url={http://dx.doi.org/10.1002/adma.200401192}, DOI={10.1002/adma.200401192}, number={11}, journal={Advanced Materials}, publisher={Wiley}, author={Cheng, X. and Guo, L. J. and Fu, P.‐F.}, year={2005}, month=may, pages={1419–1424} }

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