Abstract
A grating resolution of up to 200 nm is achieved using room‐temperature nanoimprint lithography on several different light‐emitting low‐molar‐mass organic semiconductors, without any degradation of the active materials after patterning (see Figure). This could be the only process that permits the transfer of a height profile to films of this very important class of low‐molar‐mass conjugated molecules with poor thermoplastic behavior.
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Dates
Type | When |
---|---|
Created | 21 years, 5 months ago (March 23, 2004, 8:44 a.m.) |
Deposited | 1 year, 9 months ago (Nov. 20, 2023, 2:20 p.m.) |
Indexed | 1 year ago (Aug. 16, 2024, 3:06 a.m.) |
Issued | 21 years, 5 months ago (March 18, 2004) |
Published | 21 years, 5 months ago (March 18, 2004) |
Published Online | 21 years, 5 months ago (March 22, 2004) |
Published Print | 21 years, 5 months ago (March 18, 2004) |
@article{Pisignano_2004, title={Room‐Temperature Nanoimprint Lithography of Non‐thermoplastic Organic Films}, volume={16}, ISSN={1521-4095}, url={http://dx.doi.org/10.1002/adma.200305832}, DOI={10.1002/adma.200305832}, number={6}, journal={Advanced Materials}, publisher={Wiley}, author={Pisignano, D. and Persano, L. and Raganato, M. F. and Visconti, P. and Cingolani, R. and Barbarella, G. and Favaretto, L. and Gigli, G.}, year={2004}, month=mar, pages={525–529} }