DOI: 10.1002/adfm.200305060. Reliable Monolayer‐Template Patterning of SnO<sub>2</sub> Thin Films from Aqueous Solution and Their Hydrogen‐Sensing Properties

Reliable Monolayer‐Template Patterning of SnO2 Thin Films from Aqueous Solution and Their Hydrogen‐Sensing Properties

10.1002/adfm.200305060

Crossref journal-article

Wiley

Advanced Functional Materials (311)

Abstract

AbstractWe demonstrate a novel lithographic technique utilizing a solvent to fabricate a chemically based semiconductor microdevice from an aqueous solution. According to this technique, SnO2 thin film could be integrated onto predefined sites on a SiO2/Si wafer. A patterned octadecyltrimethoxysilane self‐assembled monolayer (ODS‐SAM) was prepared by vacuum ultraviolet (VUV) irradiation through a photomask to use as a template for the fabrication of a micropatterned SnO2 thin film on the SiO2/Si surface. A Sn‐based thin film was then deposited onto the entire surface of the ODS template from an aqueous solution containing 0.03 mol L–1 of SnCl2·2H2O at 60 °C for 16 h in an ambient atmosphere. The thin film deposited on the methyl‐terminated area of the template was then peeled using an ultrasonic rinse in anhydrous toluene for 30 min, while the film deposited on the silanol area remained intact and undamaged. Rinsing in hydrophilic solvents did not facilitate peeling of the thin film from the methyl‐terminated area. We succeeded by this process in obtaining a high‐resolution, micropatterned Sn‐based thin film on an ODS‐SAM template on Si. The as‐deposited film was composed of fine Sn‐based particles. The sensitivity of this SnO2 thin film to H2 gas increases linearly with improving crystallinity. The effectiveness of anhydrous toluene as a rinse in solution lithography is discussed from the viewpoint of the high hydrophobic affinity between the rinse solvent and the terminal groups in the monolayer template.

Bibliography

Shirahata, N., Shin, W., Murayama, N., Hozumi, A., Yokogawa, Y., Kameyama, T., Masuda, Y., & Koumoto, K. (2004). Reliable MonolayerâTemplate Patterning of SnO2 Thin Films from Aqueous Solution and Their HydrogenâSensing Properties. Advanced Functional Materials, 14(6), 580â588. Portico.

Authors 8

N. Shirahata (first)
W. Shin (additional)
N. Murayama (additional)
A. Hozumi (additional)
Y. Yokogawa (additional)
T. Kameyama (additional)
Y. Masuda (additional)
K. Koumoto (additional)

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Dates

Type	When
Created	21 years, 2 months ago (June 17, 2004, 7:02 a.m.)
Deposited	1 year, 9 months ago (Nov. 17, 2023, 2:38 p.m.)
Indexed	2 months, 1 week ago (June 13, 2025, 10:44 a.m.)
Issued	21 years, 2 months ago (June 1, 2004)
Published	21 years, 2 months ago (June 1, 2004)
Published Online	21 years, 2 months ago (June 17, 2004)
Published Print	21 years, 2 months ago (June 1, 2004)

Funders 0

None

BibTeX

@article{Shirahata_2004, title={Reliable Monolayer‐Template Patterning of SnO2 Thin Films from Aqueous Solution and Their Hydrogen‐Sensing Properties}, volume={14}, ISSN={1616-3028}, url={http://dx.doi.org/10.1002/adfm.200305060}, DOI={10.1002/adfm.200305060}, number={6}, journal={Advanced Functional Materials}, publisher={Wiley}, author={Shirahata, N. and Shin, W. and Murayama, N. and Hozumi, A. and Yokogawa, Y. and Kameyama, T. and Masuda, Y. and Koumoto, K.}, year={2004}, month=jun, pages={580–588} }

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